Supported and Free-Standing Sulfonic Acid Functionalized Mesostructured Silica Films with High Proton Conductivity

Autor(en)

Ralf Supplit, Ayae Sugawara, Herwig Peterlik, Ryuji Kikuchi, Tatsuya Okubo

Abstrakt

Sulfonic acid functionalized silica films with 2D-hexagonal mesostructures of various channel sizes are prepared in a one-step synthesis. A successful combination of in situ oxidation of a mercapto-functionalized silane with an evaporation induced self-assembly (EISA) process in the presence of amphiphilic block copolymers allows the formation of a highly structured material with a sulfonation degree of 33%. Analysis of the mesostructure by a combination of XRD, grazing-incidence small-angle X-ray scattering (GI-SAXS), and TEM shows that 2D-hexagonally ordered mesostructured films are obtained by optimization of the surfactant to silica precursor ratio. The tuneability of the mesochannel size is demonstrated by the use of three different surfactants. The complete oxidation of the mercapto group to sulfonic acid is confirmed by Fourier transform infrared spectroscopy (FTIR). The thermal stability of the material is investigated by coupled thermogravimetric analysis, differential temperature analysis, and mass spectrometry (TGA-DTA-MS). Alternating current (AC) impedance analysis of humidified samples shows high proton conductivity of up to 0.18 S cm(-1) at 60 degrees C and 95 % relative humidity.

Organisation(en)

Dynamik Kondensierter Systeme

Externe Organisation(en)

University of Tokyo

Journal

European Journal of Inorganic Chemistry

Band

2010

Seiten

3993-3999

Anzahl der Seiten

7

ISSN

1434-1948

DOI

https://doi.org/10.1002/ejic.201000293

Publikationsdatum

2010

Peer-reviewed

Ja

ÖFOS 2012

1030 Physik, Astronomie

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/supported-and-freestanding-sulfonic-acid-functionalized-mesostructured-silica-films-with-high-proton-conductivity(86f98480-4ae4-491e-8250-39b38092bb00).html