Publications

Supported and Free-Standing Sulfonic Acid Functionalized Mesostructured Silica Films with High Proton Conductivity

Author(s)
Ralf Supplit, Ayae Sugawara, Herwig Peterlik, Ryuji Kikuchi, Tatsuya Okubo
Abstract

Sulfonic acid functionalized silica films with 2D-hexagonal mesostructures of various channel sizes are prepared in a one-step synthesis. A successful combination of in situ oxidation of a mercapto-functionalized silane with an evaporation induced self-assembly (EISA) process in the presence of amphiphilic block copolymers allows the formation of a highly structured material with a sulfonation degree of 33%. Analysis of the mesostructure by a combination of XRD, grazing-incidence small-angle X-ray scattering (GI-SAXS), and TEM shows that 2D-hexagonally ordered mesostructured films are obtained by optimization of the surfactant to silica precursor ratio. The tuneability of the mesochannel size is demonstrated by the use of three different surfactants. The complete oxidation of the mercapto group to sulfonic acid is confirmed by Fourier transform infrared spectroscopy (FTIR). The thermal stability of the material is investigated by coupled thermogravimetric analysis, differential temperature analysis, and mass spectrometry (TGA-DTA-MS). Alternating current (AC) impedance analysis of humidified samples shows high proton conductivity of up to 0.18 S cm(-1) at 60 degrees C and 95 % relative humidity.

Organisation(s)
Dynamics of Condensed Systems
External organisation(s)
University of Tokyo
Journal
European Journal of Inorganic Chemistry
Volume
2010
Pages
3993-3999
No. of pages
7
ISSN
1434-1948
DOI
https://doi.org/10.1002/ejic.201000293
Publication date
2010
Peer reviewed
Yes
Austrian Fields of Science 2012
1030 Physics, Astronomy
Portal url
https://ucrisportal.univie.ac.at/en/publications/supported-and-freestanding-sulfonic-acid-functionalized-mesostructured-silica-films-with-high-proton-conductivity(86f98480-4ae4-491e-8250-39b38092bb00).html